Silicon nitride nanosieve membrane

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Tong, Hien D. and Jansen, Henri V. and Gadgil, Vishwas J. and Bostan, Cazimir G. and Berenschot, Erwin and Rijn van, Cees J.M. and Elwenspoek, Miko (2004) Silicon nitride nanosieve membrane. Nano letters, 4 (2). pp. 283-287. ISSN 1530-6984

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Abstract:An array of very uniform cylindrical nanopores with a pore diameter as small as 25 nm has been fabricated in an ultrathin micromachined silicon nitride membrane using focused ion beam (FIB) etching. The pore size of this nanosieve membrane was further reduced to below 10 nm by coating it with another silicon nitride layer. This nanosieve membrane possesses adequate mechanical strength up to several bars of transmembrane pressure, and it can withstand high temperatures up to 900 C. In addition, it is inert to many aggressive chemicals such as hot concentrated potassium hydroxide (KOH), piranha (H2SO4 + H2O2), and nitric acid (HNO3).
Item Type:Article
Copyright:© 2004 American Chemical Society
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/47649
Official URL:http://dx.doi.org/10.1021/nl0350175
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Metis ID: 218304