A new technique for accurately defined deposition of catalyst thin films in deep flow channels of high-temperature gas microreactors


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Tiggelaar, R.M. and Berenschot, J.W. and Oosterbroek, R.E. and Male van, P. and Croon de, M.H.J.M. and Schouten, J.C. and Berg van den, A. (2003) A new technique for accurately defined deposition of catalyst thin films in deep flow channels of high-temperature gas microreactors. In: Transducers 2003: 12th International Conference on Solid-State Sensors, Actuators and Microsystems, June 9-12, 2003, Boston, MA, USA.

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Abstract:By using microreactors fabricated with silicon microtechnology, heterogeneous catalyzed gas-phase reactions can be studied which are difficult to control because of their exothermic nature, are explosive or use toxic/hazardous gases. In this type of microreactors, catalytic materials like rhodium or platinum are deposited on a thin membrane in deep trenches. Conventional techniques, like lift-off lithography, cannot be used in deep trenches and deposition through flat shadow masks does not yield well-defined regions of catalyst. For well-controlled deposition of a catalytic thin film on a membrane located in a deep trench, a technique is developed using sputter deposition with a 3-dimensionally shaped 'self-aligning' shadow mask.
Item Type:Conference or Workshop Item
Copyright:© 2003 IEEE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/46929
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