Fabrication of an active nanostencil with integrated microshutters


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Tjerkstra, R.W. and Ekkels, P. and Krijnen, G.J.M. and Egger, S. and Berenschot, J.W. and Ma, K.C. and Brugger, J. (2003) Fabrication of an active nanostencil with integrated microshutters. In: 12th International Conference on TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, June 8-12, 2003, Boston, USA.

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Abstract:An active nanostencil, consisting of a thin (200 nm) silicon nitride membrane with attached polysilicon microactuators that can be used to dynamically open and/or close holes in the silicon nitride membrane, is presented. This nanostencil can be used as a shadow mask in an evaporation setup. Main features of the nanostencil are the absence of sacrificial oxide in the final product, strengthening of the membrane by a polysilicon hexagonal structure that is attached directly to the membrane and the use of low-doped regions in the polysilicon to separate the stator and rotor electrically.
Item Type:Conference or Workshop Item
Copyright:©2003 IEEE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/46524
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Metis ID: 215248