Fabrication of an active nanostencil with integrated microshutters


Tjerkstra, R.W. and Ekkels, P. and Krijnen, G.J.M. and Egger, S. and Berenschot, J.W. and Ma, K.C. and Brugger, J. (2003) Fabrication of an active nanostencil with integrated microshutters. In: 12th International Conference on TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, June 8-12, 2003, Boston, USA (pp. pp. 1651-1654).

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Abstract:An active nanostencil, consisting of a thin (200 nm) silicon nitride membrane with attached polysilicon microactuators that can be used to dynamically open and/or close holes in the silicon nitride membrane, is presented. This nanostencil can be used as a shadow mask in an evaporation setup. Main features of the nanostencil are the absence of sacrificial oxide in the final product, strengthening of the membrane by a polysilicon hexagonal structure that is attached directly to the membrane and the use of low-doped regions in the polysilicon to separate the stator and rotor electrically.
Item Type:Conference or Workshop Item
Copyright:©2003 IEEE
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/46524
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Metis ID: 215248