Fabrication and characterization of dual sputtered Pd-Cu alloy films for hydrogen separation membranes

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Hoang, H.T. and Tong, H.D. and Gielens, F.C. and Jansen, H.V. and Elwenspoek, M.C. (2004) Fabrication and characterization of dual sputtered Pd-Cu alloy films for hydrogen separation membranes. Materials Letters, 3-4 (58). pp. 525-528. ISSN 0167-577X

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Abstract: this paper, submicron thin Pd–Cu alloy films are deposited using a dual sputtering technique, which allows a high composition control of the layer. The composition, surface morphology and phase structure of the sputtered layers are investigated by energy-dispersive spectrometry (EDS), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray diffractiometry (XRD). For example, the XRD data prove that the Pd–Cu layers are an alloy of Pd and Cu. Subsequently, the characterized Pd–Cu alloy layers are deposited on a silicon support structure to create a 750-nm thin Pd–Cu membrane for hydrogen separation. The reported membrane obtained a high flux of 1.6 mol H2/m2 s at a temperature of 725 K, while the selectivity is at least 500 for H2/He.

Item Type:Article
Copyright:© 2003 Elsevier Science B.V.
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/46298
Official URL:http://dx.doi.org/10.1016/S0167-577X(03)00539-1
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Metis ID: 214506