Reorientation of magnetic anisotropy in obliquely sputtered metallic thin films

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Lisfi, A. and Lodder, J.C. and Wormeester, H. and Poelsema, B. (2002) Reorientation of magnetic anisotropy in obliquely sputtered metallic thin films. Physical Review B: Condensed matter and materials physics, 66 (17). p. 174420. ISSN 1098-0121

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Abstract:Reorientation in the magnetic anisotropy as a function of film thickness has been observed in Co-Ni and Co thin films, obliquely sputtered on a polyethylene terephthalate substrate at a large incidence angle (70°). This effect is a consequence of the low magnetocrystalline anisotropy of the films (fcc structure of Co) and changes in microstructure from nuclei to columns according to the thickness. The critical thickness for this transition was estimated to be 30 nm for Co-Ni.
Item Type:Article
Copyright:© 2002 The American Physical Society
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/44064
Official URL:http://dx.doi.org/10.1103/PhysRevB.66.174420
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Metis ID: 208311