High finesse vertically coupled waveguide-microring resonators based on Si3NA-SiO2 technology


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Tan, F.S. and Klunder, D.J.W. and Kelderman, H. and Hoekstra, H.J.W.M. and Driessen, A. (2002) High finesse vertically coupled waveguide-microring resonators based on Si3NA-SiO2 technology. In: IEEE/LEOS Workshop on Fibre and Optical Passive Components, WFOPC 2002, 5-6 June 2002, Glasgow, Scotland (pp. pp. 228-232).

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Abstract:A simple waveguiding structure with vertically coupled microring resonators has been realized. A finesse of more than 100 could be achieved by using Si/sub 3/N/sub 4/-SiO/sub 2/ technology. The devices have been realized by means of standard optical lithography processes and reactive ion etching (RIE).
Item Type:Conference or Workshop Item
Copyright:© 2002 IEEE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/44054
Official URL:http://dx.doi.org/10.1109/FOPC.2002.1015832
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Metis ID: 208287