Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures


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Bostan, C.G. and Ridder, R.M. de and Dorssen, I. van and Wolferen, H.A.G.M. van and Kuipers, L. and Hulst, N.F. van (2002) Modeling and process design for laser interference lithography used in fabricating two-dimensional periodic structures. In: 4th International Conference on Transparent Optical Networks, ICTON 2002, April 21-25, 2002, Warsaw, Poland (pp. p. 61).

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Abstract:Laser interference lithography (LIL) is a technique that can be successfully used for realization of 2D periodic structures, with excellent uniformity over large areas. However, detailed modeling is needed in order to extract the optimum design parameters. In this paper, we refer to a design procedure for LIL applied to fabricating photoresist templates for photonic crystal semiconductor slabs with periodic lattices of holes
Item Type:Conference or Workshop Item
Additional information:Cat. Nr. 02EX551
Copyright:© 2002 IEEE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/44028
Official URL:http://dx.doi.org/10.1109/ICTON.2002.1007851
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