2D-confined nanochannels fabricated by conventional micromachining


Tas, N.R. and Lammerink, T.S.J. and Mela, P. and Jansen, H.V. and Elwenspoek, M. and Berg, A. van den (2002) 2D-confined nanochannels fabricated by conventional micromachining. Nano Letters, 2 (9). pp. 1031-1032. ISSN 1530-6984

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Abstract:Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 m. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs.
Item Type:Article
Copyright:© 2002 American Chemical Society
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/43530
Official URL:https://doi.org/10.1021/nl025693r
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