Advanced sacrificial poly-Si technology for fluidic sytems


Berenschot, J.W. and Tas, N.R. and Lammerink, T.S.J. and Elwenspoek, M. and Berg, A. van den (2002) Advanced sacrificial poly-Si technology for fluidic sytems. Journal of Micromechanics and Microengineering, 12 (5). pp. 621-624. ISSN 0960-1317

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Abstract:Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, such as V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.
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Copyright:© Institute of Physics and IOP Publishing Limited 2006
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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