Advanced sacrificial poly-Si technology for fluidic sytems

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Berenschot, J.W. and Tas, N.R. and Lammerink, T.S.J. and Elwenspoek, M. and Berg van den, A. (2002) Advanced sacrificial poly-Si technology for fluidic sytems. Journal of Micromechanics and Microengineering, 12 (5). pp. 621-624. ISSN 0960-1317

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Abstract:Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, such as V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.
Item Type:Article
Copyright:© Institute of Physics and IOP Publishing Limited 2006
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/43328
Official URL:http://dx.doi.org/10.1088/0960-1317/12/5/317
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