Electroactive gate materials for a hydrogen peroxide sensitive E-MOSFET

Share/Save/Bookmark

Anh, Dam T.V. and Olthuis, W. and Bergveld, P. (2002) Electroactive gate materials for a hydrogen peroxide sensitive E-MOSFET. IEEE Sensors Journal, 2 (1). pp. 26-33. ISSN 1530-437X

open access
[img]
Preview
PDF
148kB
Abstract:Describes the detection principle of a hydrogen peroxide sensor based on the electrolyte metal oxide semiconductor field effect transistor (EMOSFET) and possibilities of using different types of redox materials as the gate material for the sensor with respect to the sensitivity and detection limit. After discussing the fundamentals of hydrogen peroxide detection and a short description of the EMOSFET characteristics in terms of its threshold voltage, the basic measuring principle of hydrogen peroxide using the EMOSFET is shown. The EMOSFET with electro-active gate materials such as iridium oxide, potassium ferric ferrocyanide, and Os-polyvinylpyridine containing peroxidase, have been studied. These different materials are compared with each other with respect to their sensitivity, detection limit, and stability. The sensitivity of the sensors is improved by applying an external current between the gate and the solution
Item Type:Article
Copyright:©2002 IEEE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/43217
Official URL:http://dx.doi.org/10.1109/7361.987058
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page

Metis ID: 206108