Self-assembled monolayers coatings on nanostencils for the reduction of materials adhesion

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Kolbel, Marius and Tjerkstra, R. Willem and Kim, Gyuman and Brugger, Jürgen and Rijn, Cees J.M. van and Nijdam, Wietze and Huskens, Jurriaan and Reinhoudt, David N. (2003) Self-assembled monolayers coatings on nanostencils for the reduction of materials adhesion. Advanced Functional Materials, 13 (3). pp. 219-224. ISSN 1616-301X

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Abstract:Nanostencils (shadow masks with submicrometer apertures in a thin silicon nitride membrane) are promising tools for the facile one-step generation of nanopatterns of various materials by physical vapor deposition. Evaporation through a shadow mask is accompanied by gradual clogging of the apertures due to adhesion of evaporated material. In order to reduce this effect, nanostencils were coated with alkyl and perfluoroalkyl self-assembled monolayers (SAMs). The formation and properties of SAMs on planar silicon nitride substrates were studied by contact angle goniometry, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The SAMs are stable under evaporation of gold at various angles. SAM-coated nanostencils showed considerably less adhesion of gold compared to bare SixNy stencils.
Item Type:Article
Copyright:© 2003 WILEY-VCH
Faculty:
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/40873
Official URL:http://dx.doi.org/10.1002/adfm.200390033
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Metis ID: 215581