Photoplastic near-field optical probe with sub-100 nm aperture made by replication from a nanomould

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Kim, G.M. and Kim, B.J. and Have, E.S. ten and Segerink, F. and Hulst, N.F. van and Brugger, J. (2003) Photoplastic near-field optical probe with sub-100 nm aperture made by replication from a nanomould. Journal of Microscopy, 209 (3). pp. 267-271. ISSN 0022-2720

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Abstract:Polymers have the ability to conform to surface contours down to a few nanometres. We studied the filling of transparent epoxy-type EPON SU-8 into nanoscale apertures made in a thin metal film as a new method for polymer/metal near-field optical structures. Mould replica processes combining silicon micromachining with the photo-curable SU-8 offer great potential for low-cost nanostructure fabrication. In addition to offering a route for mass production, the transparent pyramidal probes are expected to improve light transmission thanks to a wider geometry near the aperture. By combining silicon MEMS, mould geometry tuning by oxidation, anti-adhesion coating by self-assembled monolayer and mechanical release steps, we propose an advanced method for near-field optical probe fabrication. The major improvement is the possibility to fabricate nanoscale apertures directly o­n wafer scale during the microfabrication process and not o­n free-standing tips. Optical measurements were performed with the fabricated probes. The full width half maximum after a Gaussian fit of the intensity profile indicates a lateral optical resolution of approximate to 60 nm.
Item Type:Article
Copyright:© 2003 Blackwell
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Link to this item:http://purl.utwente.nl/publications/40497
Official URL:http://dx.doi.org/10.1046/j.1365-2818.2003.01134.x
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