Shadow-Mask Evaporation through Monolayer-Modified Nanostencils

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Kolbel, Marius and Tjerkstra, R. Willem and Brugger, Jürgen and Rijn, Cees J.M. van and Nijdam, Wietze and Huskens, Jurriaan and Reinhoudt, David N. (2002) Shadow-Mask Evaporation through Monolayer-Modified Nanostencils. Nano Letters, 2 (12). pp. 1339-1343. ISSN 1530-6984

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Abstract:Gradual clogging of the apertures of nanostencils used as miniature shadow masks in metal evaporations can be reduced by coating the stencil with self-assembled monolayers (SAM). This is quantified by the dimensions (height and volume) of gold features obtained by nanostencil evaporation as measured by scanning electron microscopy (SEM) and atomic force microscopy (AFM). An increase in material deposition through the apertures by more than 100% can be achieved with SAM-coated stencils, which increases their lifetime.
Item Type:Article
Copyright:© 2002 American Chemical Society
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/38013
Official URL:http://dx.doi.org/10.1021/nl025784o
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Metis ID: 207736