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Application of highly uniform LPCVD SiOxNy in SHG devices
Wörhoff, K. and Lambeck, P.V. and Albers, H. and Noordman, O.F.J. and Hulst van, N.F. and Popma, Th.J.A. (1996) Application of highly uniform LPCVD SiOxNy in SHG devices. In: IEEE/LEOS Symposium Benelux Chapter, November 28, 1996, Enschede, The Netherlands.
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| Item Type: | Conference or Workshop Item |
| Copyright: | © 1996 University of Twente, MESA Research Institute |
| Faculty: | Electrical Engineering, Mathematics and Computer Science (EEMCS) |
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| Link to this item: | http://purl.utwente.nl/publications/25486 |
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