Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity

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Wörhoff, K. and Lambeck, P.V. and Noordman, O.F.J. and Hulst van, N.F. and Popma, Th.J.A. (1997) Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity. In: European Symposium on Lasers and Optics in Manufacturing, 16 -20 June, 1997, Munich, Germany.

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Item Type:Conference or Workshop Item
Copyright:© 1997 SPIE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/25418
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Metis ID: 130220