Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity

Share/Save/Bookmark

Wörhoff, K. and Lambeck, P.V. and Noordman, O.F.J. and Hulst, N.F. van and Popma, Th.J.A. (1997) Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity. In: Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications, 16 -20 June, 1997, Munich, Germany (pp. pp. 257-268).

[img] PDF - Published Version
Restricted to UT campus only
: Request a copy
439kB
Abstract:The thickness non-uniformity and refractive index in- homogeneity of silicon oxynitride thin films, grown by low pressure chemical vapor deposition, have been optimized. The present work was especially motivated by the application of these thin films as well defined waveguides in phase-matched second harmonic generating devices, which are well known for their extremely high requirements to uniformity and homogeneity. However, other demanding integrated optical components like gratings, sensor systems, telecommunication devices, etc., also strongly benefit from highly uniform waveguides.
Item Type:Conference or Workshop Item
Copyright:© 1997 SPIE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/25418
Official URL:https://doi.org/10.1117/12.281235
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page

Metis ID: 130220