Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity

Wörhoff, K. and Lambeck, P.V. and Noordman, O.F.J. and Hulst van, N.F. and Popma, Th.J.A. (1997) Optimization of LPCVD Silicon Oxynitride growth to large refractive index homogeneity and layer thickness uniformity. In: European Symposium on Lasers and Optics in Manufacturing, 16 -20 June, 1997, Munich, Germany.

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Item Type:	Conference or Workshop Item
Copyright:	© 1997 SPIE
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Integrated Optical MicroSystems (IOMS)
Link to this item:	http://purl.utwente.nl/publications/25418
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Metis ID: 130220