Photoplastic SU-8 probes for Near-Field Optical Applications


Share/Save/Bookmark

Brugger, Jürgen and Kim, Beomjoon and Hulst van, Niek (2000) Photoplastic SU-8 probes for Near-Field Optical Applications. In: 2000 IEEE/LEOS International Conference on Optical MEMS, 21-24 August, 2000, Sheraton Kauai, Hawaii.

[img]
Preview
PDF
171Kb
Abstract:We propose a new attempt to solve the manufacturing problem of SNOM probes by a novel wafer-scale microfabrication process for sharp pyramidal and bright photoplastic probes. The probes are fabricated of a transparent photoplastic material (SU-8) which allows simple batch fabrication based on spin coating and subsequent near-ultraviolet exposure and development steps. SU-8 consists of the epoxy-based EPON SU-8 resin photosensitized with a triaryl sulfonium salt. The main interest for MOEMS applications is that SU-8 is transparent. These combined advantages are used here to define a sharp, transparent and high aspect ratio probe dedicated for near-field optical applications
Item Type:Conference or Workshop Item
Copyright:© 2000 IEEE
Research Group:
Link to this item:http://purl.utwente.nl/publications/25384
Official URL:http://dx.doi.org/10.1109/OMEMS.2000.879662
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page

Metis ID: 130185