Magnetic Microstructure of sputtered Co-Cr films
Berge ten, P. and Lodder, J.C. and Plößl, R. and Chapmann, J.N. (1993) Magnetic Microstructure of sputtered Co-Cr films. Journal of Magnetism and Magnetic Materials, 120 (1-3). pp. 362-365. ISSN 0304-8853
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| Abstract: | The magnetic microstructure of a thickness series of Co81Cr19 layers on Si3N4 membranes is investigated by modified differential phase contrast (MDPC) microscopy. The development from cross-rie wall structures for a thickness < 25 nm to more complicated structures for a thickness > 50 nm is related to the macroscopic VSM measurements and the crystallite orientation determined from electron diffraction experiments. |
| Item Type: | Article |
| Copyright: | © 1993 Elsevier Science |
| Faculty: | Electrical Engineering, Mathematics and Computer Science (EEMCS) |
| Research Group: | |
| Link to this item: | http://purl.utwente.nl/publications/24278 |
| Official URL: | http://dx.doi.org/10.1016/0304-8853(93)91362-B |
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Metis ID: 129078

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