Magnetic Microstructure of sputtered Co-Cr films

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Berge, P. ten and Lodder, J.C. and Plößl, R. and Chapmann, J.N. (1993) Magnetic Microstructure of sputtered Co-Cr films. Journal of Magnetism and Magnetic Materials, 120 (1-3). pp. 362-365. ISSN 0304-8853

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Abstract:The magnetic microstructure of a thickness series of Co81Cr19 layers on Si3N4 membranes is investigated by modified differential phase contrast (MDPC) microscopy. The development from cross-rie wall structures for a thickness < 25 nm to more complicated structures for a thickness > 50 nm is related to the macroscopic VSM measurements and the crystallite orientation determined from electron diffraction experiments.
Item Type:Article
Copyright:© 1993 Elsevier Science
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/24278
Official URL:http://dx.doi.org/10.1016/0304-8853(93)91362-B
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Metis ID: 129078