Adsorption of atomic and molecular oxygen on Si(100)2x1: coverage dependence of the Auger O KVV lineshape.

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Wormeester, H. and Borg, H.J. and Terpstra, D. and Keim, E.G. and Silfhout, A. van (1991) Adsorption of atomic and molecular oxygen on Si(100)2x1: coverage dependence of the Auger O KVV lineshape. Solid State Communications, 77 (3). pp. 239-242. ISSN 0038-1098

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Abstract:By means of Auger electron spectroscopy (AES) we have monitored the room temperature adsorption of O2 and N2O on the clean Si(0 0 1)2 × 1 surface. We have found, for the first time, a significant variation in the intensity ratio of the K L1 L1 and K L23 L23 O Auger lines in the submonolayer range. This variation can be related to a change in bonding configuration of the oxygen atom/molecule in the initial adsorption stage in which the influence of inter-atomic matrix elements of the Auger process cannot be neglected.
Item Type:Article
Copyright:© 1991 Elsevier Science
Faculty:
Science and Technology (TNW)
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/24058
Official URL:http://dx.doi.org/10.1016/0038-1098(91)90340-2
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