Oxygen diffusion in laserablated YBa2Cu3Ox thin films studied by spectroscopic ellipsometry

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Span, Edward A.F. and Wormeester, Herbert and Blank, Dave H.A. and Rogalla, Horst (1998) Oxygen diffusion in laserablated YBa2Cu3Ox thin films studied by spectroscopic ellipsometry. Materials Science and Engineering B: Solid-state materials for advanced technology, 56 (2-3). pp. 123-129. ISSN 0921-5107

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Abstract:In the photon energy range of 2.1 to 4.6 eV and in the temperature range of 20 to 700oC, the complex dielectric function of oxygen deficient YBa2Cu3O6 has been measured and compared to that of YBa2Cu3Ox in an ambient of 1 bar of oxygen, using spectroscopic ellipsometry. It has been observed that the optical 4 eV transition, which is associated with oxygen deficiency, vanishes before the YBCO thin film is fully oxygenated. Oxygen diffusion coefficients have been estimated by real-time monitoring of the dielectric function during isothermal in-diffusion. It has been found that for T¿300oC oxygen can enter the YBCO thin film whereas for T=200oC, no oxygen in-diffusion has been observed.
Item Type:Article
Copyright:© 1998 Elsevier Science S.A.
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/24003
Official URL:http://dx.doi.org/10.1016/S0921-5107(98)00223-2
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