Investigation of the microstructure of ramp-type YBa2Cu3O7-δ structures

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Sato, H. and Roesthuis, F.J.G. and Sonnenberg, A.H. and Rijnders, A.J.H.M. and Rogalla, H. and Blank, D.H.A. (2000) Investigation of the microstructure of ramp-type YBa2Cu3O7-δ structures. Superconductor Science and Technology, 13 (5). pp. 522-526. ISSN 0953-2048

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Abstract:We studied the morphology of ramps in YBa2Cu3O7-δ films and, subsequently, the barrier layer. The ramps have been fabricated by Ar ion beam milling using standard photoresist masks. SEM and AFM showed the formation of tracks along the slope of the ramp, originating from the irregular shape of the edge of the photoresist mask. A proposed modified reflowed resist and pre-annealing process show a significantly smoother ramp surface, important for the fabrication of reproducible Josephson junctions.
Item Type:Article
Copyright:© 2000 IOP Publishing Ltd
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/23988
Official URL:http://dx.doi.org/10.1088/0953-2048/13/5/319
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