The generation and detection of high flux atomic oxygen for physical vapor deposition thin film growth

Ingle, N.J.C. and Hammond, R.H. and Beasley, M.R. and Blank, D.H.A. (1999) The generation and detection of high flux atomic oxygen for physical vapor deposition thin film growth. Applied Physics Letters, 75 (26). pp. 4162-4164. ISSN 0003-6951

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Abstract:	The growth of many epitaxial thin-film oxides is significantly enhanced with the use of an oxidizing agent such as atomic oxygen, ozone, or NO2. We developed a flow-through microwave plasma source to generate large atomic oxygen fluxes while maintaining vacuum pressures of less that 1×10¿4 Torr. Continuous and real-time detection of the atomic oxygen was achieved by atomic absorption of the 130 nm atomic oxygen lines. Atomic oxygen fluxes of at least 1.4×1018 atoms/cm2 s and dissociation efficiencies of around 100% were obtained
Item Type:	Article
Copyright:	©1999 American Institute of Physics
Faculty:	Science and Technology (TNW)
Research Group:	Inorganic Materials Science (IMS)
Link to this item:	http://purl.utwente.nl/publications/23971
Official URL:	http://dx.doi.org/10.1063/1.125569
Publisher URL:	http://link.aip.org/link/?APPLAB/75/4162/1
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