Wet etching methods for perovskite substrates

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Leca, Victor and Rijnders, Guus and Koster, Gertjan and Blank, Dave H.A. and Rogalla, Horst (2000) Wet etching methods for perovskite substrates. Materials Research Society symposia proceedings (587). O3.6.1-O3.6.4. ISSN 02729172

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Abstract:In oxide electronics substrates with atomically flat terraces are a request for growing high-quality epitaxial thin films. In this paper results on chemical etching of some substrates with perovskite, ABO3, structure (e.g., SrTiO3, LSAT - the (LaAlO3)0.3(Sr2AlTaO6)0.35 solid solution, and NdGaO3) are presented. In order to obtain high quality substrates, different etchants (NH4F + HF, HCl + NH4Cl, and HCl + HNO3) with various pH values have been studied. From Atomic Force Microscopy (AFM), in air, we conclude that, irrespective of the etchant that has been used, a substrate surface with a BOx terminated layer and atomically flat terraces without etch pits could be obtained. The pH-value and temperature of the etchant and the etching time, however, influence significantly the surface quality. Reflection high energy electron diffraction (RHEED) patterns confirmed the AFM results.
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Copyright:© 2000 Materials Research Society
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/23916
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