Wet etching methods for perovskite substrates


Leca, Victor and Rijnders, Guus and Koster, Gertjan and Blank, Dave H.A. and Rogalla, Horst (2000) Wet etching methods for perovskite substrates. Materials Research Society symposia proceedings (587). O3.6.1-O3.6.4. ISSN 02729172

[img] PDF
Restricted to UT campus only
: Request a copy
Abstract:In oxide electronics substrates with atomically flat terraces are a request for growing high-quality epitaxial thin films. In this paper results on chemical etching of some substrates with perovskite, ABO3, structure (e.g., SrTiO3, LSAT - the (LaAlO3)0.3(Sr2AlTaO6)0.35 solid solution, and NdGaO3) are presented. In order to obtain high quality substrates, different etchants (NH4F + HF, HCl + NH4Cl, and HCl + HNO3) with various pH values have been studied. From Atomic Force Microscopy (AFM), in air, we conclude that, irrespective of the etchant that has been used, a substrate surface with a BOx terminated layer and atomically flat terraces without etch pits could be obtained. The pH-value and temperature of the etchant and the etching time, however, influence significantly the surface quality. Reflection high energy electron diffraction (RHEED) patterns confirmed the AFM results.
Item Type:Article
Copyright:© 2000 Materials Research Society
Science and Technology (TNW)
Research Group:
Link to this item:http://purl.utwente.nl/publications/23916
Export this item as:BibTeX
HTML Citation
Reference Manager


Repository Staff Only: item control page

Metis ID: 128715