Basic elements for photodeposited high Tc thin film devices

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Flokstra, J. and IJsselsteijn, R.P.J. and Hilgenkamp, J.W.M. (1992) Basic elements for photodeposited high Tc thin film devices. Thin solid films, 218 (1-2). pp. 304-309. ISSN 0040-6090

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Abstract:Flat films, high quality insulating layers and adequately superconducting via contacts are basic elements for high Tc device fabrication. We studied the influence of the process parameters of laser deposition on the occurrence of droplets and outgrowths in YBaCuO films. The droplet density is minimal when a laser fluence below about 1.0 J cm-2 is used. The outgrowth density decreases with increasing laser pulse rate or decreasing deposition temperature. High quality flat films were obtained with a rate of 10 Hz and at a temperature of 720 °C. Wet chemical etching and etching with an Argon ion source were used for structuring multilayers with SrTiO3 as an insulating layer. Smooth edges were obtained with an argon gun. Bromine and EDTA etching are not adequate techniques for fabricating controllable well-defined edges. Cross-overs, via contacts and coils were prepared.
Item Type:Article
Copyright:© 1992 Elsevier Science
Faculty:
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/23709
Official URL:http://dx.doi.org/10.1016/0040-6090(92)90930-A
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Metis ID: 128508