A long pulse discharge excited ArF Laser

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Feenstra, L. and Bastiaens, H.M.J. and Peters, P.J.M. and Witteman, W.J. (1999) A long pulse discharge excited ArF Laser. IEEE Journal of Selected Topics in Quantum Electronics, 5 (6). pp. 1515-1521. ISSN 1077-260X

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Abstract:An X-ray preionised, discharge excited ArF excimer laser, λ=193 nm, has been studied in the long pulse regime. The laser performance is found to be primarily dependent on the discharge stability, and therefore, on the gas composition, preionization timing and the pumping power. Using X-ray preionization and prepulse-mainpulse excitation, laser pulselengths of up to 120-ns full-width at half-maximum at 4 mJ/l are obtained by decreasing the partial pressures of the active ingredients, F2 and Ar, and using Ne as a buffer gas. This is almost six times as long as usual for discharge excited ArF lasers.
Item Type:Article
Copyright:©1999 IEEE
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Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/23696
Official URL:http://dx.doi.org/10.1109/2944.814992
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