The black silicon method IV: the fabrication of three dimensional structures in silicon with high aspect ratios for scanning probe microscopy and other applications


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Jansen, Henri and Boer, Meint de and Otter, Bert and Elwenspoek, Miko (1995) The black silicon method IV: the fabrication of three dimensional structures in silicon with high aspect ratios for scanning probe microscopy and other applications. In: Micro Electro Mechanical Systems, MEMS '95, January 29 - February 2, 1995, Amsterdam, the Netherlands (pp. pp. 88-93).

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Abstract:The recently developed black silicon method (BSM) is presented as a powerful tool in finding recipes for the fabrication of MEMS building blocks such as Ay-stages. scanning probe tips, inkjet filters, multi-electrodes for neuro-electronic interfaces, and mouldings Lor direct patterning into polymers. The fabrication of these blocks in silicon with high aspect ratios and smooth surface textures will be described and discussed by using the BSM and standard reactive ion etching (ME).
Item Type:Conference or Workshop Item
Copyright:© 1995 IEEE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/17229
Official URL:http://dx.doi.org/10.1109/MEMSYS.1996.493989
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