A Monte Carlo study of etching in the presence of a mask junction

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Veenendaal van, E. and Cuppen, H. and Enckevort van, W.J.P. and Suchtelen van, J. and Nijdam, A.J. and Elwenspoek, M.C. and Vlieg, E. (2000) A Monte Carlo study of etching in the presence of a mask junction. In: MicroMechanics Europe (MME) 2000, October 1-3, 2000, Uppsala, Sweden .

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Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Metis ID: 113075