Velocity sources as an explanation for experimentally observed variations in Si ${111}$ etch rates

Nijdam, A.J. and Berenschot, J.W. and Suchtelen van, J. and Gardeniers, J.G.E. and Elwenspoek, M.C. (1998) Velocity sources as an explanation for experimentally observed variations in Si ${111}$ etch rates. In: Micromechanics Europe Conference, MME, June 3–5, 1998, Ulvik, Norway.

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Item Type:	Conference or Workshop Item
Faculty:	Science and Technology (TNW) Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Mesoscale Chemical Systems (MCS) Transducers Science and Technology (TST)
Link to this item:	http://purl.utwente.nl/publications/16022
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Metis ID: 112904

Velocity sources as an explanation for experimentally observed variations in Si etch rates