Suppression and origin of soft ESD failures in a submicron CMOS process

Kuper, Fred and Luchies, Jan Marc and Bruines, Joop (1994) Suppression and origin of soft ESD failures in a submicron CMOS process. Journal of Electrostatics, 33 (3). pp. 313-325. ISSN 0304-3886

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Abstract:	Soft failures occurring after low-level ESD stress of thick and thin oxide NMOSTs in a submicron CMOS process have been studied. Simple drain engineering appears to have a dramatic improving effect. Simulation is used to study the cause for the soft failures.
Item Type:	Article
Copyright:	© 1994 Elsevier Science
Faculty:	Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:	Semiconductor Components (SC)
Link to this item:	http://purl.utwente.nl/publications/15178
Official URL:	http://dx.doi.org/10.1016/0304-3886(94)90037-X
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Metis ID: 112052