29 Si-Nuclear magnetic resonance on the etching products of silicon in potassium hydroxide solutions

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Nijdam, A.J. and Veenendaal, E. van and Gardeniers, J.G.E. and Kentgens, A.P.M. and Nachtegaal, G.H. and Elwenspoek, M. (2000) 29 Si-Nuclear magnetic resonance on the etching products of silicon in potassium hydroxide solutions. Journal of the Electrochemical Society, 147 (6). pp. 2195-2198. ISSN 0013-4651

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Abstract:We present results of 29Si-nuclear magnetic resonance experiments on a large number of KOH solutions in which silicon has been dissolved. The goal of the experiments is to clarify the chemical composition of concentrated alkaline solutions after etching of silicon. It is confirmed that the initial etching product of wet-chemical etching of silicon in KOH is a silicate monomer. Increasing the silicon content of the solution gives rise to silicate polymerization products. The often reported aging of etching solutions is due to silica in the etchant
Item Type:Article
Copyright:© 2000 The Electrochemical Society
Faculty:
Science and Technology (TNW)
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/14653
Official URL:http://dx.doi.org/10.1149/1.1393506
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