Fabrication of microsieves with sub-micron pore size by laser interference lithography

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Kuiper, Stein and Wolferen van, Henk and Rijn van, Cees and Nijdam, Wietze and Krijnen, Gijs and Elwenspoek, Miko (2001) Fabrication of microsieves with sub-micron pore size by laser interference lithography. Journal of Micromechanics and Microengineering, 11 (1). pp. 33-37. ISSN 0960-1317

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Abstract:Laser interference lithography is a low-cost method for the exposure of large
surfaces with regular patterns. Using this method, microsieves with a pore
size of 65 nm and a pitch of 200 nm have been fabricated. The pores are
formed by inverting a square array of photoresist posts with a chromium
lift-off process and by subsequent reactive-ion etching using the chromium
as an etch mask. The method has wider process latitude than direct
formation of holes in the resist layer and the chromium mask allows for
etching of pores with vertical sidewalls.
Item Type:Article
Copyright:© Institute of Physics and IOP Publishing Limited 2001
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/14647
Official URL:http://dx.doi.org/10.1088/0960-1317/11/1/306
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