Microsieves made with laser interference lithography for micro-filtration applications


Rijn, Cees J.M. van and Nijdam, Wietze and Kuiper, Stein and Veldhuis, Gert J. and Wolferen, Henk van and Elwenspoek, Miko (1999) Microsieves made with laser interference lithography for micro-filtration applications. Journal of Micromechanics and Microengineering, 9 (2). pp. 170-172. ISSN 0960-1317

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Abstract:A microsieve with a very uniform pore size of 260 nm and a pore to pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micro-machining technology.

The sieve consists of a 0.1 µm thick silicon nitride membrane perforated with sub-micron diameter pores and a macro perforated silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.
Item Type:Article
Copyright:© Institute of Physics and IOP Publishing Limited 1999
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/14592
Official URL:https://doi.org/10.1088/0960-1317/9/2/316
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Metis ID: 111688