Microsieves made with laser interference lithography for micro-filtration applications

Share/Save/Bookmark

Rijn van, Cees J.M. and Nijdam, Wietze and Kuiper, Stein and Veldhuis, Gert J. and Wolferen van, Henk and Elwenspoek, Miko (1999) Microsieves made with laser interference lithography for micro-filtration applications. Journal of Micromechanics and Microengineering, 9 (2). pp. 170-172. ISSN 0960-1317

[img]PDF
Restricted to UT campus only
: Request a copy
716Kb
Abstract:A microsieve with a very uniform pore size of 260 nm and a pore to pore spacing of 510 nm has been fabricated using multiple exposure interference lithography and (silicon) micro-machining technology.

The sieve consists of a 0.1 µm thick silicon nitride membrane perforated with sub-micron diameter pores and a macro perforated silicon support. The calculated clean water flux is at least one to two orders higher than that of conventional inorganic membranes.
Item Type:Article
Copyright:© Institute of Physics and IOP Publishing Limited 1999
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/14592
Official URL:http://dx.doi.org/10.1088/0960-1317/9/2/316
Export this item as:BibTeX
EndNote
HTML Citation
Reference Manager

 

Repository Staff Only: item control page

Metis ID: 111688