High quality ZnO layers with adjustable refractive indices for integrated optics applications


Heideman, R.G. and Lambeck, P.V. and Gardeniers, J.G.E. (1995) High quality ZnO layers with adjustable refractive indices for integrated optics applications. Optical Materials, 4 (64). pp. 741-755. ISSN 0925-3467

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Abstract:Thin ( 1 μm) crystalline ZnO films with a good optical quality and good (0002) texture are grown under two considerably different process parameter sets using a r.f. planar magnetron sputtering unit. The optical parameters of the two corresponding ZnO layers are distinctly different: high refractive index ( 2.0 at λ = 632.8 nm) ZnO films resembling the single crystal form, and ZnO films with considerably lower (typical difference 0.05) refractive indices. The refractive index of the latter ZnO layers is adjustable ( 1.93–1.96 at λ = 632.8 nm) through the process deposition parameters. It is shown that the difference in refractive index between the two ZnO types most probably results from a difference in package density of the crystal columns. The optical waveguide losses of both ZnO types are typically 1–3 dB/cm at λ = 632.8 nm, however the low refractive index ZnO layers need a post-deposition anneal step to obtain these values. The two ZnO types are used to fabricate optical channel-and slab waveguides with small refractive index differences.
Item Type:Article
Copyright:© 1995 Elsevier Science
Science and Technology (TNW)
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Link to this item:http://purl.utwente.nl/publications/14268
Official URL:https://doi.org/10.1016/0925-3467(95)00028-3
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