Deflection and maximum load of microfiltration membrane sieve made with silicon micromachining

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Rijn, Cees van and Wekken, Michiel van der and Nijdam, Wietze and Elwenspoek, Miko (1997) Deflection and maximum load of microfiltration membrane sieve made with silicon micromachining. Journal of Microelectromechanical Systems, 6 (1). pp. 48-54. ISSN 1057-7157

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Abstract:With the use of silicon micromachining, an inorganic membrane sieve for microfiltration has been constructed having a silicon nitride membrane layer with thickness typically 1 ¿m and perforations typically between 0.5 ¿m and 10 ¿m in diameter. As a support a ¿100¿-silicon wafer with openings of 1000 ¿m in diameter has been used. The thin silicon nitride layer is deposited on an initially dense support by means of a suitable chemical vapor deposition method (LPCVD). Perforations in the membrane layer are obtained with use of standard photo lithography and reactive ion etching (RIE). The deflection and maximum load of the membrane sieves are calculated in a first approximation. Experiments to measure the maximum load of silicon-rich silicon nitride membranes have confirmed this approximation
Item Type:Article
Copyright:© 1997 IEEE
Faculty:
Electrical Engineering, Mathematics and Computer Science (EEMCS)
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Link to this item:http://purl.utwente.nl/publications/14255
Official URL:http://dx.doi.org/10.1109/84.557530
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