Porous silicon bulk micromachining for thermally isolated membrane formation

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Ducso, Cs. and Vazsonyi, E. and Adam, M. and Szabo, I. and Barsony, I. and Gardeniers, J.G.E. and Berg van den, A. (1997) Porous silicon bulk micromachining for thermally isolated membrane formation. Sensors and Actuators A: Physical, 60 (1-3). pp. 235-239. ISSN 0924-4247

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Abstract:A novel low thermal budget technique is proposed for the preparation of thermally isolated silicon membranes. The selective formation of porous silicon in a p-type silicon wafer results in an undercut profile below the implanted n-type silicon regions. The sacrificial porous layer is subsequently removed in a dilute KOH solution. A non-stoichiometric LPCVD nitride layer combination forms the suspension of the single-crystalline silicon membranes. This technique eliminates the need for epitaxial substrates and backside alignment, and proves to be very efficient in the realization of a high-temperature micro-hotplate operating with minimum power consumption for the purpose of integrated gas sensors.
Item Type:Article
Copyright:© 1997 Elsevier Science
Faculty:
Science and Technology (TNW)
Electrical Engineering, Mathematics and Computer Science (EEMCS)
Research Group:
Link to this item:http://purl.utwente.nl/publications/14234
Official URL:http://dx.doi.org/10.1016/S0924-4247(97)01384-8
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