Stability of oriented silicalite-1 films in view of zeolite membrane preparation

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Exter den, M.J. and Bekkum van, H. and Rijn van, C.J.M. and Kapteijn, F. and Moulijn, J.A. and Schellevis, H. and Beenakker, C.I.N. (1997) Stability of oriented silicalite-1 films in view of zeolite membrane preparation. Zeolites, 19 (1). pp. 13-20. ISSN 01442449

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Abstract:Silicalite-1 is grown as b- and (a, b)-oriented monolayers on silicon wafers and on silicon wafers containing low-stress silicon nitride windows, aiming at two new membrane systems. The orientation of crystals determines the stability (crack formation), due to tensile or compressive stress, imposed on the layer after removal of the organic template. By application of etching procedures, the nitride support can be removed, leaving the crystal layer undamaged. The latter makes preparation of oriented and nonsupported thin layers for gas separation purposes possible.
Item Type:Article
Copyright:© 1997 Elsevier Science
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Link to this item:http://purl.utwente.nl/publications/14228
Official URL:http://dx.doi.org/10.1016/S0144-2449(97)00044-4
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