On the kinetic study of electrochemical vapour deposition

Haart de, L.G.J. and Lin, Y.S. and Vries de, K.J. and Burggraaf, A.J. (1991) On the kinetic study of electrochemical vapour deposition. Solid State Ionics, 47 (3-4). pp. 331-336. ISSN 0167-2738

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Abstract:	A theoretical analysis is presented which quantitatively describes the transition behavior of the kinetics of the electrochemical vapour deposition of yttria-stabilized zirconia on porous substrates. It is shown that up to a certain deposition time and corresponding film thickness the rate limiting step is oxygen diffusion through the substrate pores, giving a linear dependence of the film thickness on the deposition time. For longer deposition times, i.e. thicker films, a transition of the rate limiting step to bulk electrochemical diffusion in the film occurs, resulting in a parabolic dependence of the film thickness on the deposition time. Simulation results are presented to show the effects of the experimental conditions on this transition time.
Item Type:	Article
Copyright:	© 1991 Elsevier Science
Research Group:	Inorganic Materials Science (IMS)
Link to this item:	http://purl.utwente.nl/publications/12694
Official URL:	http://dx.doi.org/10.1016/0167-2738(91)90256-B
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Metis ID: 106875