On the kinetic study of electrochemical vapour deposition

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Haart, L.G.J. de and Lin, Y.S. and Vries, K.J. de and Burggraaf, A.J. (1991) On the kinetic study of electrochemical vapour deposition. Solid State Ionics, 47 (3-4). pp. 331-336. ISSN 0167-2738

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Abstract:A theoretical analysis is presented which quantitatively describes the transition behavior of the kinetics of the electrochemical vapour deposition of yttria-stabilized zirconia on porous substrates. It is shown that up to a certain deposition time and corresponding film thickness the rate limiting step is oxygen diffusion through the substrate pores, giving a linear dependence of the film thickness on the deposition time. For longer deposition times, i.e. thicker films, a transition of the rate limiting step to bulk electrochemical diffusion in the film occurs, resulting in a parabolic dependence of the film thickness on the deposition time. Simulation results are presented to show the effects of the experimental conditions on this transition time.
Item Type:Article
Copyright:© 1991 Elsevier Science
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Link to this item:http://purl.utwente.nl/publications/12694
Official URL:http://dx.doi.org/10.1016/0167-2738(91)90256-B
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Metis ID: 106875