The effect of thermal annealing on the properties of alumina films prepared by metal organic chemical vapour deposition at atmospheric pressure

Haanappel, V.A.C. and Corbach van, H.D. and Fransen, T. and Gellings, P.J. (1994) The effect of thermal annealing on the properties of alumina films prepared by metal organic chemical vapour deposition at atmospheric pressure. Surface and Coatings Technology, 64 (3). pp. 183-193. ISSN 0257-8972

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Abstract:	Thin films deposited at 330°C by metal organic chemical vapour deposition on stainless steel, type AISI 304, were annealed in a nitrogen atmosphere for 1, 2 and 4 h at 600, 700 and 800°C. The film properties, including the protection of the underlying substrate against high temperature corrosion, the chemical composition of the film and the microstructure, were investigated. Corrosion experiments performed at 450°C in a hydrogen sulphide containing gas, showed that the cracks in the alumina films almost completely disappeared after a post-deposition heat treatment, probably as a result of stress relaxation. The porosity of the alumina films was not affected by this heat treatment. X-ray diffraction measurements of these films, deposited at 330°C, revealed an amorphous structure. Owing to the thermal annealing process, the amorphous alumina films were converted to λ-alumina, and OH-groups disappeared.
Item Type:	Article
Copyright:	© 1994 Elsevier Science
Research Group:	Catalytic Processes and Materials (CPM) Inorganic Materials Science (IMS) Anorganic Chemistry
Link to this item:	http://purl.utwente.nl/publications/10100
Official URL:	http://dx.doi.org/10.1016/0257-8972(94)90106-6
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