The effect of thermal annealing on the properties of thin alumina films prepared by low pressure MOCVD

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Haanappel, V.A.C. and Vendel, D. van de and Corbach, H.D. van and Fransen, T. and Gellings, P.J. (1995) The effect of thermal annealing on the properties of thin alumina films prepared by low pressure MOCVD. Thin Solid Films, 256 (1-2). pp. 8-12. ISSN 0040-6090

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Abstract:Thin amorphous alumina films were prepared on stainless steel, type AISI 304, by low pressure metal-organic chemical vapour deposition. The effect of thermal annealing in nitrogen (for 2, 4 and 17 h at 600, 700 and 800 °C) on the film properties, including the protection of the underlying substrate against high temperature corrosion and the chemical composition of the film, were investigated.

Corrosion experiments performed at 450 °C in a hydrogen sulphide-containing gas, showed that the thermal annealing process had a detrimental effect on the protective properties of the alumina films. From FTIR and Auger measurements, it was found that the amorphous alumina, containing boehmite, converted to ¿-alumina during the annealing process.
Item Type:Article
Copyright:© 1995 Elsevier Science
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Link to this item:http://purl.utwente.nl/publications/10062
Official URL:http://dx.doi.org/10.1016/0040-6090(95)80026-3
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Metis ID: 105475