Al2O3 coatings against high temperature corrosion deposited by metal-organic low pressure chemical vapour deposition

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Corbach, H.D. van and Haanappel, V.A.C. and Fransen, T. and Gellings, P.J. (1994) Al2O3 coatings against high temperature corrosion deposited by metal-organic low pressure chemical vapour deposition. Thin Solid Films, 239 (1). pp. 31-36. ISSN 0040-6090

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Abstract:Metal-organic chemical vapour deposition of thin amorphous films of Al2O3 on steels was performed at low pressure. Aluminium tri-sec-butoxide (ATSB) was used as a precursor. The effects of the deposition temperature (200–380 °C), the deposition pressure (0.17–1.20 kPa) and the ATSB concentration ((5.5−33.5) × 10−4 kPa) were studied with respect to the growth rate of the coating and the sulphidation properties at high temperatures. The sulphidation experiments were performed for 70 h at 450 °C in a gas atmosphere consisting of 1% H2S, 1.5% H2O, 19% H2, Ar balance. From the results and scanning electron microscopy observations the best process conditions were determined.
Item Type:Article
Copyright:© 1994 Elsevier Science
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Link to this item:http://purl.utwente.nl/publications/10056
Official URL:http://dx.doi.org/10.1016/0040-6090(94)90104-X
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Metis ID: 105472