The pyrolytic decomposition of metal alkoxides (di-acetoxy-di-t-butoxy-silane, DADBS) during chemical vapour deposition of thin oxide films

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Hofman, R. and Westheim, J.G.F. and Haanappel, V.A.C. and Fransen, T. and Gellings, P.J. (1993) The pyrolytic decomposition of metal alkoxides (di-acetoxy-di-t-butoxy-silane, DADBS) during chemical vapour deposition of thin oxide films. Theoretica Chimica Acta, 215 . pp. 329-335. ISSN 0040-5744

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Abstract:In this study the effects of the nature of metal alkoxides on their vapour pressures and thermal decomposition chemistry are reported. The vapour pressure and the volatility of a metal alkoxide strongly depends on the steric effect of its alkoxy group.

The thermal decomposition chemistry of one metal alkoxide (di-acetoxy-di-t-butoxy-silane, DADBS) has been studied by mass spectrometry at temperatures between 423 and 923 K. The pyrolytic products were acetic acid anhydride and 2-methyl propene. The acetic acid anhydride is formed at temperatures above 473 K and 2-methyl propene is formed above 673 K by a ß -hydride elimination mechanism. In these steps, a 6-ring intermediate is supposed to be formed. The silicon acid finally remaining is proposed to react by poly-condensation to SiO2 coatings or powder.
Item Type:Article
Copyright:© 1993 Elsevier Science
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Link to this item:http://purl.utwente.nl/publications/10012
Official URL:http://dx.doi.org/10.1016/0040-6031(93)80109-N
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Metis ID: 105450